Nikon's SITECH Debuts the Most Advanced, Versatile Semiconductor Inspection System Available

New OPTISTATION 3200 Delivers Exceptional Micro and Macro Inspection with Enhanced Module, Additional Load Ports

MELVILLE, N.Y., Aug. 5 -- Nikon's Semiconductor Inspection Technologies Group (SITECH) today announced the introduction of the Optistation 3200, the most versatile semiconductor inspection system available. The new Optistation model offers enhanced features, including two load ports and an improved Optional DUV module to support micro inspection at the latest design nodes.

The Optistation 3200 provides three-mode macro inspection capability -- front, backside center, and backside peripheral -- as well as high performance lighting techniques that allow for detection of a wide variety of process defects and particle/scratch detection.

The Optistation design meets user demand for flexibility and convenience. It features an extensive option base that allows users to incorporate multiple equipment types into one base platform, helping to reduce cost of ownership. Nikon's CFI60 Optics, which offer brightfield and darkfield micro inspection, are incorporated into the Optistation 3200, in addition to an optional DUV module supporting 90nm and future design rules, Defect review software is available with ADC.

About Nikon Instruments Inc.

Nikon Instruments Inc., world leader in microscope and advanced digital imaging technology, is committed to providing its customers with quality products for bioscience research and industrial applications; high-performance semiconductor wafer handling and inspection equipment; and advanced high-speed, vision-based and optical measuring tools. For more information, visit the Nikon Web site at www.nikonusa.com. Product related inquiries can be directed to Nikon Instruments at 800-52-NIKON.