Nikon's SITECH Group Upgrades Top-of-the-Line Overlay Measurement System With the NRM-3100
New High Throughput, High Precision Tool Addresses 90 nm Technology
MELVILLE, N.Y., Aug. 4 -- Nikon's Semiconductor Inspection Technologies Group (SITECH) today debuted the next generation of its highly successful 3000 Series platform with the introduction of the NRM-3100. The high throughput, high precision Nikon metrology tool is designed to accommodate the 90nm lithography node and beyond.
The NRM-3100 is designed to measure lithographic exposure overlay precision with respect to the previous exposure layer. The instrument's advanced technology delivers sub-nanometer precision on overlay metrology with enough bandwidth to meet the demands of the upcoming 70nm technology node.
The NRM-3100's improved camera and image processing capabilities increase the move-and-measure (MAM) time to better than 1.3 seconds, providing an unmatched throughput performance of more than 150 wafers per hour. "Speed and accuracy are extremely important in this industry," noted Wayne Lam, US application engineer with Nikon's SITECH group. "The enhanced capabilities of the NRM-3100 underscore Nikon's continued commitment to deliver products that meet and exceed the rapidly changing needs of its customers."
The superior performance of the NRM 3100 is ensured by the strict lens and optical component selection methodology applied by Nikon. In addition to utilizing wavefront aberration testing to 0.0036 rms, Nikon leverages its optical expertise to measure its objective lenses to determine the higher order Zernike polynomials, minimizing lens aberration.
Additional options available for the NRM-3100 include Nikon's unique NSR Focus Mark measurement and a stepper management system that provides analysis for registration, distortion, stepping, and reticle rotation for optical focus and focus inclination. An arbitrary angle measurement system that allows measurement of marks at any angle and recipe management functions that facilitate remote recipe management operation are also available.
Nikon's NRM platform also employs an active vibration-absorption stage and stage control system that significantly reduces stage-positioning time. Its illumination system employs a fiber optic delivery system from an efficient and affordable quartz-halogen lamp, which can be easily replaced without the need for any complicated or specialized procedures.
About Nikon Instruments Inc.
Nikon Instruments Inc., world leader in microscope and advanced digital imaging technology, is committed to providing its customers with quality products for bioscience research and industrial applications; high-performance semiconductor wafer handling and inspection equipment; and advanced high-speed, vision-based and optical measuring tools. For more information, visit the Nikon Web site at www.nikonusa.com. Product related inquiries can be directed to Nikon Instruments at 800-52-NIKON.